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The Nexus
TECHNOLOGYJun 23 · 09:00 UTCMIT TECHNOLOGY REVIEWClive Thompson

The $400 million machine powering the future of chipmaking

ASML's new $400 million extreme-ultraviolet (EUV) lithography machine, developed by Jos Benschop, achieves an 8-nanometer resolution, enabling advanced chip production critical for AI and Moore's Law. The machine uses laser-generated EUV light to pattern silicon wafers with atomic precision.

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ASMLorganizationJos BenschoppersonTSMCorganizationextreme-ultraviolet (EUV) lithographytopicMoore's LawtopicAI industrytopic8-nanometer resolutiontopic
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