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extreme-ultraviolet (EUV) lithography

Coverage of extreme-ultraviolet (EUV) lithography in the Nexus archive.

Earliest in view: Jun 23 · 09:00 UTCMost recent: Jun 23 · 09:00 UTC
Co-mentioned in this coverage
ASMLorganization1Jos Benschopperson1TSMCorganization1Moore's Lawtopic1AI industrytopic18-nanometer resolutiontopic1
Recent coverage
  • TECHNOLOGYJun 23 · 09:00 UTCMIT TECHNOLOGY REVIEW
    The $400 million machine powering the future of chipmaking

    ASML's new $400 million extreme-ultraviolet (EUV) lithography machine, developed by Jos Benschop, achieves an 8-nanometer resolution, enabling advanced chip production critical for AI and Moore's Law. The machine uses laser-generated EUV light to pattern silicon wafers with atomic precision.